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›› 2008, Vol. 8 ›› Issue (6): 1241-1244.

• 材料工程专栏 • 上一篇    下一篇

氯化钠和六偏磷酸钠对氧化铈抛光ZF7玻璃的协同增强作用

危亮华 傅毛生 李艳花 周雪珍 周新木 焦晓燕 李永绣   

  1. 南昌大学稀土与微纳功能材料研究中心 南昌大学稀土与微纳功能材料研究中心 南昌大学稀土与微纳功能材料研究中心 南昌大学稀土与微纳功能材料研究中心 南昌大学稀土与微纳功能材料研究中心 南昌大学稀土与微纳功能材料研究中心 南昌大学稀土与微纳功能材料研究中心
  • 收稿日期:2008-08-22 修回日期:2008-10-08 出版日期:2008-12-20 发布日期:2008-12-20
  • 通讯作者: 李永绣

Synergistic Enhancement of Sodium Chloride and Sodium Hexametaphosphate in Ceria Slurry to Material Removal Rate in Polishing of ZF7 Glass

WEI Liang-hua FU Maosheng LI Yan-hua ZHOU Xue-zhen ZHOU Mu-xin JIAO Xiao-yan LI Yong-xiu   

  1. Research Center for Rare Earths & Nano/micro Functional Materials, Institute for Advanced Study, Nanchang University Research Center for Rare Earths & Nano/micro Functional Materials, Institute for Advanced Study, Nanchang University Research Center for Rare Earths & Nano/micro Functional Materials, Institute for Advanced Study, Nanchang University Research Center for Rare Earths & Nano/micro Functional Materials, Institute for Advanced Study, Nanchang University Research Center for Rare Earths & Nano/micro Functional Materials, Institute for Advanced Study, Nanchang University Research Center for Rare Earths & Nano/micro Functional Materials, Institute for Advanced Study, Nanchang University Research Center for Rare Earths & Nano/micro Functional Materials, Institute for Advanced Study, Nanchang University
  • Received:2008-08-22 Revised:2008-10-08 Online:2008-12-20 Published:2008-12-20
  • Contact: LI Yong-xiu

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摘要： 研究了添加NaCl或(NaPO3)6的氧化铈浆料对ZF7光学玻璃抛光的材料去除速率(MRR)及对应的粒子表面Zeta电位和悬浮稳定性的影响. 结果表明，加入NaCl使CeO2浆料的抛光速率下降，而(NaPO3)6则可有效提高MRR；同时添加NaCl和(NaPO3)6对MRR值有明显的协同增强作用. 用原子力显微镜测定了最大MRR值(351.26 nm/min)时抛光玻璃的表面粗糙度Ra为0.799 nm，完全可以满足高质量玻璃抛光的要求，比未加添加剂的MRR(199.36 nm/min)和Ra(0.754 nm)分别提高了76.2%和5.97%. MRR与粒子表面Zeta电位呈线性关系，证明可通过合理构筑粒子表面双电层来提高表面电性，进而提高抛光效果.

关键词: 氧化铈, 氯化钠, 六偏磷酸钠, 抛光, ZF7光学玻璃

Abstract: NaCl and (NaPO3)6 were adopted as dispersants of ceria slurry to enhance the polishing performance of ZF7 glass in terms of material removal rate and surface quality. The addition of NaCl into ceria slurry resulted in MRR decreasing, whereas the introduction of (NaPO3)6 evidently increased MRR. However when NaCl and (NaPO3)6 were co-added into ceria slurry, synergistic enhancement to MRR was observed. MRR for the slurries of pure ceria and ceria with 0.5 mol/L NaCl and 1.05%(w) (NaPO3)6 were 199.36 and 351.26 nm/min. The corresponding surface roughness Ra of as-polished ZF7 optical glass was 0.754 and 0.799 nm, which can meet the need of optical application. The linear relationship between MRR and Zeta potential of ceria particles in slurries shows that the increase of MRR is attributed to the increase of minus surface Zeta potential, indicating that the polishing ability of ceria can be greatly enhanced by adjusting surface Zeta potential of abrasive particles using sodium chloride and sodium hexametaphosphate as dispersants.

Key words: ceria slurry, NaCl, (NaPO3)6, polishing, ZF7 glass

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