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›› 2014, Vol. 14 ›› Issue (1): 64-70.

• 反应与分离 • 上一篇    下一篇

Si-Fe合金精炼-高温淬火-酸洗提纯硅

巫剑 王志 胡晓军 郭占成   

  1. 北京科技大学钢铁冶金新技术国家重点实验室 中国科学院过程工程研究所 北京科技大学理化系 北京科技大学生态与循环冶金教育部重点实验室
  • 收稿日期:2013-11-15 修回日期:2013-12-19 出版日期:2014-02-20 发布日期:2014-02-20
  • 通讯作者: 巫剑

Purification of Silicon by Si-Fe Alloy Refining-High Temperature Quenching-Acid Leaching Process

WU Jian WANG Zhi GUO Zhan-cheng,   

  1. State Key Laboratory of Advanced Metallurgy, University of Science and Technology Beijing Institute of Process Engineering, Chinese Academy of Sciences State Key Laboratory of Advanced Metallurgy, University of Science and Technology Beijing (1. Academic of Metallurgical and Ecological Engineering,University of Science and Technology Beijing
  • Received:2013-11-15 Revised:2013-12-19 Online:2014-02-20 Published:2014-02-20
  • Contact: WU Jian

摘要: 在Si-Fe合金体系中,采用高温淬火与酸洗复合精炼提纯硅,研究了淬火后硅料的微观形貌及复合提纯效果. 结果表明,硅料中杂质元素总去除率淬火前为76.82%,淬火后为96.05%. 随淬火温度升高,硅料中杂质元素的去除效果逐渐增强,1007, 1207, 1220℃下淬火的硅料杂质元素总去除率分别为91.87%, 95.19%和96.05%. 冷却速率为3℃/min时淬火后硅料中杂质元素的总去除率为96.05%,而9.5℃/min冷却速率下总去除率为94.21%.

关键词: 硅, 提纯, 合金精炼, 高温淬火, 酸洗

Abstract: The purification of silicon was carried out by Si-Fe alloy refining, high temperature quenching and acid leaching, the morphology, structure and purification effect of the silicon were studied. The results indicated that the total removal rate of impurities in the silicon before quenching was 76.82%, and after quenching 96.05%. With the increase of quenching temperature, the removal rate of impurities in silicon material after quenching was raised gradually, the total removal rate of impurities after quenching at 1007, 1207 and 1220℃ was 91.87%, 95.19% and 96.05%, respectively. Under the cooling rate of 3℃/min, the total removal rate of impurities in silicon material after quenching was 96.05%, however when the cooling rate was 9.5℃/min, the total removal rate of impurities after quenching was 94.21%.

Key words: silicon, purification, solvent refining, high temperature quenching, acid leaching

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