欢迎访问过程工程学报, 今天是
铜在硝酸介质苯并三唑抛光液中化学-机械抛光时的电化学行为
何捍卫;胡岳华;黄可龙
Electrochemical Behavior of Copper in HNO3 Aqueous Solution Containing BTA during CMP
HE Han-wei; HU Yue-hua; HUANG Ke-long
. 2002, (1): 0 -0 .