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过程工程学报 ›› 2025, Vol. 25 ›› Issue (6): 544-555.DOI: 10.12034/j.issn.1009-606X.224307

• 研究论文 • 上一篇    下一篇

亲疏水相间结构转盘反应器停留时间分布特性研究

范勇强1， 邱玉清1， 王东祥1,2*， 李财发1   

  1. 1. 江南大学机械工程学院，江苏 无锡 214122 2. 江苏省食品先进制造装备技术重点实验室，江苏 无锡 214122
  • 收稿日期:2024-09-29 修回日期:2024-12-06 出版日期:2025-06-28 发布日期:2025-07-01
  • 通讯作者: 王东祥 dxwang@jiangnan.edu.cn
  • 基金资助:
    国家自然科学基金

Study on residence time distribution characteristics of rotary disk reactor with hydrophilic-hydrophobic alternating structure

Yongqiang FAN1,  Yuqing QIU1,  Dongxiang WANG1,2*,  Caifa LI1   

  1. 1. School of Mechanical Engineering, Jiangnan University, Wuxi, Jiangsu 214122, China 2. Jiangsu Key Laboratory of Advanced Food Manufacturing Equipment & Technology, Wuxi, Jiangsu 214122, China
  • Received:2024-09-29 Revised:2024-12-06 Online:2025-06-28 Published:2025-07-01

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摘要： 通过制备不同亲疏水相间表面结构转盘反应器，采用脉冲示踪法研究了不同转速和流量下的不同亲疏水相间表面结构转盘内的液体停留时间分布。结果表明，增加转速和流量使光滑盘的无量纲方差值减小，停留时间分布曲线变窄，液膜流动行为更趋近于理想活塞流，而增加转盘表面的疏水层条数，无量纲方差值随转速和流量的变化趋势不再单调减小。此外，随着流量增加，液体在反应器中的平均停留时间会减小，而转盘表面疏水层条数的改变对于平均停留时间也存在一定影响，但无显著规律性。另外，流量、转速和疏水层条数的改变还会影响转盘表面流体的流动特性与混合性能，光滑盘的串联反应器级数和佩克莱数均会随流量和转速增加而增大，表明液膜流动行为在接近活塞流的同时，转盘表面的返混程度和分散程度也逐渐减小，而疏水层条数增加使串联反应器级数和佩克莱数随转速和流量的变化趋势不再单调增大。通过对不同亲疏水相间结构转盘串联反应器级数和佩克莱数的相关影响因素进行无量纲分析，建立了串联反应器级数和佩克莱数的预测关联式。本研究有助于进一步理解反应器表面非均匀浸润对于液体停留时间分布及返混程度的影响，可为转盘反应器设计与优化提供指导意义。

关键词: 转盘反应器, 脉冲示踪法, 亲疏水相间, 停留时间

Abstract: The residence time distribution (RTD) of liquid in the rotary disk reactor with different hydrophilic-hydrophobic surface structures at different rotational speeds and flow rates is studied by pulse tracer method. The results show that the increase of rotational speed and flow rate reduces the dimensionless variance of the smooth disk, narrows the residence time distribution curve, and make the liquid film flow behavior closer to the ideal piston flow. An increase in the number of hydrophobic layer stripes on the disk surface causes the trend of the dimensionless variance value with respect to rotational speed and flow rate to no longer decreases monotonically. Moreover, with the increase of flow rate, the average residence time of liquid in the reactor decreases, and the change of the number of hydrophobic layers on the surface of the turntable also has a certain influence on the average residence time, but there is no significant regularity. In addition, the change of flow rate, rotational speed and the number of hydrophobic layers also affect the flow characteristics and mixing performance of the fluid on the surface of the turntable. The series reactor stage and Peclet number of the smooth disk increases with the increase of flow rate and rotational speed, indicating that the liquid film flow behavior is close to the piston flow. At the same time, the degree of back mixing and dispersion on the surface of the turntable also gradually decreases for smooth disk, while an increase in the number of hydrophobic layer stripes causes the trends of the series reactor stages and Peclet number with respect to rotational speed and flow rate to no longer decreases monotonically. Based on the dimensionless analysis of the related influencing factors of the series reactor stages and Peclet number of different hydrophilic and hydrophobic interphase structures, the prediction correlation of the series reactor stages and Peclet number is established. This study is helpful to further understand the influence of non-uniform infiltration on the liquid residence time distribution and backmixing degree, and provides guidance for the design and optimization of the rotating disk reactor.

Key words: spinning disk reactor, pulse tracer method, hydrophilic-hydrophobic alternating, residence time